Photomask and method for detecting violations in a mask pattern file using a manufacturing rule
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United States of America Patent
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May 31, 2005
Grant Date -
N/A
app pub date -
Nov 21, 2002
filing date -
Nov 21, 2001
priority date (Note) -
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Abstract
A photomask and method for detecting failures in a mask pattern file using a manufacturing rule are disclosed. The method includes calculating a manufacturing rule based on a design parameter associated with a manufacturing process and measuring a dimension of a non-linear feature in a mask pattern file. A rule violation is identified in the mask pattern file if the measured dimension is less than the calculated manufacturing rule.
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