Method of reducing internal stress in materials

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United States of America Patent

PATENT NO 6893986
APP PUB NO 20040137663A1
SERIAL NO

10624427

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Abstract

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Methods are provided for adjusting and controlling the stress between layers of material in a multilayer structure. A first stress is configured in a region of stress on the substrate material. A second material is then deposited over the substrate. A second stress results between the substrate and the second material such that a net stress results where the net stress is a function of said first and second stresses. As such, the first stress can be configured to achieve a predetermined, desired net stress. For example, the first stress can be configured to cancel out the second stress such that the net stress is substantially zero.

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Patent Owner(s)

Patent OwnerAddress
WRIGHT STATE UNIVERSITY3640 COLONEL GLENN HWY DAYTON OH 45435

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Amer, Maher S Xenia, OH 1 4
Maguire, John F Bellbrook, OH 5 206

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