Plasma-assisted processing of gaseous media
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United States of America Patent
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May 10, 2005
Grant Date -
N/A
app pub date -
Feb 28, 2000
filing date -
Mar 2, 1999
priority date (Note) -
Expired
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Abstract
A reactor for the plasma-assisted processing of a gaseous medium, including a pair of electrodes having facing surfaces the separation of which is substantially uniform, with a body of dielectric material positioned between them and defining a plurality of gas passages extending through the space between the electrodes.
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