Achromatic fresnel optics based lithography for short wavelength electromagnetic radiations
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United States of America Patent
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Apr 26, 2005
Grant Date -
May 6, 2004
app pub date -
Nov 5, 2002
filing date -
Nov 9, 2001
priority date (Note) -
Expired
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Abstract
A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.
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