Scanning atom probe and analysis method utilizing scanning atom probe

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United States of America Patent

PATENT NO 6875981
APP PUB NO 20030154773A1
SERIAL NO

10333318

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Abstract

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In a scanning atom probe (100), a surface topography of a specimen (3) is firstly analyzed by a surface topography analyzing unit (20). In the next place, an extraction electrode (5) is aligned to a desired area to be analyzed of a specimen surface. In case of analyzing electronic state of the area to be analyzed, negative bias voltage is impressed onto the specimen (3) from a direct current high voltage supply (2) and field emitted electrons are detected by a screen (9). In case of analyzing atomic arrangement and composition of the area to be analyzed, positive voltage is impressed onto the specimen (3) from the direct current high voltage supply (2) and a pulse generator (1) and positive ions generated by field evaporation are detected by a position sensitive ion detector (11) or a relfectron type mass analyzer (13).

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Patent Owner(s)

Patent OwnerAddress
KANAZAWA INSTITUTE OF TECHNOLOGY7-1 OHGIGAOKA NONOICHI-SHI ISHIKAWA 921-8501

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishikawa, Osamu Kanazawa, JP 24 270

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