Source for vacuum treatment process
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United States of America Patent
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Mar 22, 2005
Grant Date -
May 22, 2003
app pub date -
Nov 13, 2002
filing date -
Nov 20, 2001
priority date (Note) -
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Abstract
The invention relates to an arc source or a source for vaporizing or sputtering of materials and a method for operating a source. The source comprises an insulated counter-electrode and/or an AC magnet system. Thereby, dependent on the requirement, any desired potential can be applied to the counter-electrode and/or the source can be operated with different magnet systems, in particular as arc or sputter source.
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