Spacer chalcogenide memory method and device

United States of America Patent

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Mar 8, 2005
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Feb 12, 2004
app pub date
Aug 9, 2002
filing date
Aug 9, 2002

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Abstract

The present invention includes devices and methods to form memory cell devices including a spacer comprising a programmable resistive material alloy. Particular aspects of the present invention are described in the claims, specification and drawings.

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Patent Owner	Address
MACRONIX INTERNATIONAL CO LTD	NO 16 LI-HSIN RD SCIENCE-BASED INDUSTRIAL PARK HSINCHU

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Lung, Hsiang Lan	Hsinchu, TW	118	7130

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Spacer chalcogenide memory method and device

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United States of America Patent

10215956

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PATENT NO	6864503
APP PUB NO	20040026686A1
SERIAL NO	10215956
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
March 08, 2005	US,6864503,B2 US6864503B2	GRANTED PATENT AS SECOND PUBLICATION
February 12, 2004	US,20040026686,A1 US20040026686A1	FIRST PUBLISHED PATENT APPLICATION

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