Sputter deposition of lithium phosphorous oxynitride material
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United States of America Patent
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Mar 8, 2005
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app pub date -
Nov 3, 2000
filing date -
Nov 3, 2000
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Abstract
A method of depositing lithium phosphorus oxynitride on a substrate, the method comprising loading a substrate into a vacuum chamber having a target comprising lithium phosphate, introducing a process gas comprising nitrogen into the chamber and maintaining the gas at a pressure of less than about 15 mTorr; and forming a plasma of the process gas in the chamber to deposit lithium phosphorous oxynitride on the substrate.
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