Illumination system particularly for microlithography
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United States of America Patent
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Feb 22, 2005
Grant Date -
May 22, 2003
app pub date -
Jul 22, 2002
filing date -
May 5, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A projection exposure apparatus for microlithography using a wavelength.ltoreq.193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.
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