Positive photosensitive composition
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United States of America Patent
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Feb 22, 2005
Grant Date -
Jan 23, 2003
app pub date -
Feb 22, 2002
filing date -
Feb 23, 2001
priority date (Note) -
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Abstract
A positive photosensitive composition comprises: (A) an acid generator capable of generating an acid upon irradiation with one of an actinic ray and a radiation; and (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and capable of decomposing by the action of an acid to increase the solubility in an alkali developer, wherein the acid generator (A) comprises at least two compounds of a sulfonium salt compound not having an aromatic ring, a triarylsulfonium salt compound, and a compound having a phenacylsulfonium salt structure.
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