Method and apparatus for removing organic films

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United States of America Patent

PATENT NO 6851873
SERIAL NO

10683288

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Abstract

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A method and an apparatus for removing an organic film, such as a resist film, from a substrate surface are provided wherein a treatment liquid containing dissolved ozone, and preferably formed from liquid ethylene or propylene carbonate, or both, is contacted with the substrate having the organic film, and the organic film removed, wherein the apparatus contains (A) a treatment liquid delivery device, (B) a film contact device, (C) a liquid circulation device and (D) an ozone dissolution device.

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Patent Owner(s)

Patent OwnerAddress
NOMURA MICRO SCIENCE CO LTDJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Endo, Mitsuru Yokohama, JP 53 1173
Muraoka, Hisashi Yokohama, JP 19 575
Muraoka, Rieko Yokohama, JP 2 45
Sato, Asuka Yokohama, JP 3 46

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