Method and apparatus for a pellicle frame with porous filtering inserts
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United States of America Patent
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Jan 25, 2005
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N/A
app pub date -
Dec 9, 2002
filing date -
Feb 10, 2000
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Expired
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Abstract
A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
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