Exposure device and method for compensating optical defects

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6844920
APP PUB NO 20030077089A1
SERIAL NO

10149298

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Abstract

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An exposure device for exposing a projection of an electronically stored artwork pattern onto a substrate, in particular a printing plate 1, with image processing electronics (2) that can store the image data, with a light modulator (7) that can be electronically controlled by the image processing electronics (2), in particular an LCD display (7) or a micro-mirror device, with an illuminating device (8, 9) for illuminating the light modulator (7), and with a projection lens (11) for projecting the light modulator (7) onto the substrate (1), is improved according to the invention in that the image processing electronics (2) include a compensation device (4, 5) to compensate for optical defects and/or tolerances in the beam path of the exposure device.

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Patent Owner(s)

Patent OwnerAddress
XEIKON PREPRESS NV8900 IEPER

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Luellau, Friedrich Voegelsen, DE 7 49

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