Lithography system comprising a converter plate and means for protecting the converter plate
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United States of America Patent
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Jan 18, 2005
Grant Date -
Feb 13, 2003
app pub date -
Aug 13, 2002
filing date -
Aug 13, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A lithography system comprising a converter element (7) for receiving light and converting said light in a plurality of electron beams (15) to be directed towards and focused on a substrate (10) to be processed, said plurality of electron beams (15) being used to define a pattern in a resist layer (20) on said substrate (10), wherein said lithography system is provided with a protective foil with holes at the positions of the electron beams (23) being arranged to protect, in use, said converter element (7) from contamination with material from the resist layer (21).
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