Method of producing a strain-sensitive resistor
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United States of America Patent
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Jan 18, 2005
Grant Date -
Apr 3, 2003
app pub date -
Nov 6, 2002
filing date -
Mar 31, 1998
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of producing a strain sensitive resistor includes matching an area of a film insulating layer to a shape of a recess in a surface of a support element. The film insulating area is applied to the support element so that the area of the film matching the shape of the recess is congruent with the shape of the recess. A resistive layer comprising strain-sensitive resistors is applied to the film insulating layer and the film insulating layer and the resistive layer are applied to heat treatment.
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