Method for apodizing a planar waveguide grating
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United States of America Patent
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Jan 11, 2005
Grant Date -
Mar 20, 2003
app pub date -
Sep 14, 2001
filing date -
Sep 14, 2001
priority date (Note) -
Expired
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Abstract
A method for making an apodized Bragg grating in a photosensitive, planar, linear waveguide. A photosensitive, planar, linear waveguide is provided on a surface of a substrate. A patterned phase mask is placed between the waveguide and a laser beam. The waveguide is exposed through the phase mask to the laser beam wherein either the laser beam is moving at a substantially constant velocity with respect to the substrate and phase mask, or the substrate and phase mask are moving at a substantially constant velocity with respect to the laser beam. The beam has a smoothly varying intensity profile, and the exposure is conducted at an angle of more than 0.degree. and less than 90.degree. to the longitudinal axis of the waveguide under conditions sufficient to induce a modulation in the index of refraction of the waveguide and impart an apodized Bragg grating in the waveguide corresponding to the phase mask pattern.
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