Ion beam apparatus, ion beam processing method and sample holder member

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United States of America Patent

PATENT NO 6838685
SERIAL NO

10629217

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Abstract

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An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the holder member that contains the section to remove a damage layer on the section. The gas ion beam from the gas ion beam irradiation device irradiates the section from a rear surface side of the sample at a specified incident angle.

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Patent Owner(s)

Patent OwnerAddress
HITACHI HIGH-TECH SCIENCE CORPORATION24-14 NISHI-SHIMBASHI 1-CHOME MINATO-KU TOYKO 105-0003

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujii, Toshiaki Chiba, JP 81 870
Hasuda, Masakatsu Chiba, JP 13 77
Iwasaki, Kouji Chiba, JP 26 242
Kodama, Toshio Chiba, JP 6 38
Sugiyama, Yasuhiko Chiba, JP 50 243
Takagi, Yasuyuki Chiba, JP 21 152

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