Electron-beam lithography

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 6835943
APP PUB NO 20030155532A1
SERIAL NO

10275649

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

A device for electron-beam lithography wherein very small pits can be written, using a small beam intensity, by exposing each pit several times during writing. A row of electron beams is arranged in the longitudinal direction of the track. Each beam from the row of beams can be controlled, either to be projected onto the track via electron optics, or to be scattered to an electron absorbing position. The control of the row of beams ensures that each time a track position to be exposed passes the projection position of a beam from said row of beams, the beam in question is projected onto the position in question. Furthermore means are provided for shifting the beams from the row of beams in transverse direction on the track for the purpose of writing a second track simultaneously with the main track. Finally, several rows of beams arranged one beside another for simultaneously writing onto two tracks arranged one beside another are described.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SINGULUS MASTERING B VMARINUS VAN MEELWEG 2 5657 EN EINDHOVEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Jager Pieter Willem Herman Rotterdam, NL 85 1247
Van, Vlimmeren Quirinus Antonius Gerardus Veldhoven, NL 1 1
Verhaart, Gerardus Johannes Eindhoven, NL 2 3

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation