Method for creating radial profiles on a substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Dec 14, 2004
Grant Date -
Nov 7, 2002
app pub date -
Apr 1, 2002
filing date -
Jan 26, 1999
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The present invention is directed to a method for depositing a radial profile of a target material onto a substrate. The method comprises directing one or more target materials toward a substrate, blocking some predetermined portion of the target material with at least a first shutter so that it does not strike the substrate, and rotating the substrate relative to the first shutter while the target material is directed toward the substrate so that a radial profile is formed on the substrate. In on embodiment, the substrate is rotated, and the first shutter does not rotate. In another embodiment, the first shutter rotates and the substrate does not rotate. The method permits a radial thickness or composition gradient on the substrate to be formed. The method may also include using one or more contact masks placed on the substrate during the deposition in order to mask off particular portions of the substrate during the deposition process.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully