Method and apparatus for treating surface of substrate plate
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United States of America Patent
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Nov 23, 2004
Grant Date -
Dec 19, 2002
app pub date -
Nov 20, 2001
filing date -
Jun 18, 2001
priority date (Note) -
Expired
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Abstract
Method and apparatus for treating a surface of a substrate plate under irradiation of ultraviolet ray emitted from a dielectric barrier discharge lamp. Upon admission into a treating chamber, oxygen is removed from a treating surface and surrounding atmosphere of a substrate plate in order to suppress energy losses of ultraviolet ray to a minimum.
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