Methods for producing thin film magnetic devices having increased orientation ratio
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 23, 2004
Grant Date -
May 30, 2002
app pub date -
Dec 22, 2000
filing date -
Oct 10, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of producing a thin film magnetic device comprising forming a thin film of magnetic material over a surface of a substrate having a controlled surface topography, wherein the surface of the substrate is first subject to isotropic etching so as to increase the capacity of the substrate surface to induce a high orientation ratio in a thin film of magnetic material formed over the substrate surface without a reduction in the smoothness of the substrate; and a method of modifying a thin film magnetic device comprising a thin film of a magnetic material, the method comprising the step of subjecting a surface of the thin film magnetic device having a controlled surface topology to isotropic etching so as to increase the orientation ratio of the thin film magnetic device without reducing the smoothness of the surface of the thin film magnetic device.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully