Exposure method and apparatus
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United States of America Patent
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Nov 16, 2004
Grant Date -
Sep 18, 2003
app pub date -
Mar 7, 2003
filing date -
Mar 14, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An exposure method includes the light incidence step of letting at least a part of light emitted from a light source for exposure use be incident on a mask supported by a supporting device, and the imaging step of forming an image of a mask pattern on a photosensitive material by guiding the reflecting light from the mask such that the photosensitive material supported by the supporting device receives the reflecting light coming from an incidence direction which is different from the incidence direction of the light incident on the mask.
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