Method and apparatus for exposure
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United States of America Patent
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Nov 9, 2004
Grant Date -
Dec 18, 2003
app pub date -
Jun 9, 2003
filing date -
Jun 18, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Disclosed is an exposure method and apparatus (aligner) for exposure wherein there is reduced a physical load put on a driving mechanism which moves a supporting device for supporting a mask and an exposure object which has a photosensitive material, and the structure of the driving mechanism is simplified. The method comprises an incidence step of letting at least a part of light from a light source for exposure be incident on a mask supported by a supporting device; an imaging step of letting transmission light from the mask be incident on a photosensitive material supported by the supporting device from a direction which is different from a direction of light incident on the mask, thereby causing the transmission light to form an image on the photosensitive material; a rotation step of rotating the supporting device such that a position of irradiation to the mask caused by light from the light source changes along a circumferential direction of the supporting device; and an irradiation position changing step of changing the position of irradiation of light to the mask as well as a position of irradiation of light to the photosensitive material along a direction which is different from the circumferential direction of the supporting device in a rotating plane of the supporting device while the supporting device is being rotated.
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