Vacuum treatment chamber and method for treating surfaces
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United States of America Patent
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Nov 9, 2004
Grant Date -
Jan 3, 2002
app pub date -
Mar 29, 2001
filing date -
Sep 30, 1998
priority date (Note) -
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Abstract
The invention relates to a vacuum treatment chamber for work pieces which comprises at least one induction coil for at least co-generating a treatment plasma in a discharge chamber which is located in the interior of the coil. It also comprises a screen which is arranged between the discharge chamber and the coil, and which is coaxial in relation to the axis of the coil. The screen comprises slots which have a directional component which is parallel to the coil axis. The screen is formed by a self-contained body. The slots are provided along at least the main part of the body's circumference in a slot density per circumferential length unit of S=(number of slots)/cm equaling 0.5.ltoreq.S.
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