Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice
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United States of America Patent
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-
Nov 2, 2004
Grant Date -
Jan 17, 2002
app pub date -
May 22, 2001
filing date -
May 22, 2000
priority date (Note) -
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Abstract
The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.
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