X-ray fluorescence thickness measurement device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 26, 2004
Grant Date -
Jan 31, 2002
app pub date -
Jul 27, 2001
filing date -
Jul 27, 2000
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An X-ray fluorescence film thickness measuring device has an X-ray generating system generating and irradiating primary X-rays. A focusing system focuses primary X-rays irradiated from the X-ray generating system onto microscopic measurement regions in a sample. A sample observation optical system is used to observe the sample during focusing of the primary X-rays for use in positioning of the microscopic measurement regions relative to the primary X-rays. A first sensor with low counting efficiency but high energy resolution detects X-ray fluorescence generated from a sample having the microscopic measurement regions. A second sensor has low energy resolution but high counting efficiency compared to the first sensor. Each of a pair of pre-amplifiers receives a signal from a respective one of the first and second sensors.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully