Photo-definable self-assembled materials
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 26, 2004
Grant Date -
Sep 12, 2002
app pub date -
Mar 19, 2002
filing date -
Apr 5, 1999
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: a templating molecule, a photoactivator generator, a material capable of being sol-gel processed, water, and a solvent; and exposing the film to light to form a patterned mesoporous material.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully