Method of forming optical thin film
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United States of America Patent
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Oct 19, 2004
Grant Date -
Feb 12, 2004
app pub date -
Aug 1, 2003
filing date -
Aug 29, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method for forming an optical thin film used for optical elements of laser systems including high-energy lasers and an optical element of optical apparatuses is provided. The optical thin film can be easily formed on a desired substrate with reproducibility by vapor-depositing a porous fluoride layer for preventing reflection in the deep ultraviolet region, and can be easily removed in a short time to reuse the substrate if the thin film damaged. A water-insoluble material (2) for preventing reflection is vapor-deposited onto an optical element substrate (1). A water-soluble material (3) having a higher particle energy is vapor-deposited onto the surface of the water-insoluble material (2). The water-soluble material (3) permeates deep into the water-insoluble material (2) to form a mixed film on the surface of the substrate (1). Then, the water-soluble material (3) is dissolved and removed to form a porous thin film (5) comprising the water-insoluble material (2).
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