Adaptive GCIB for smoothing surfaces
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United States of America Patent
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Oct 19, 2004
Grant Date -
Oct 3, 2002
app pub date -
Oct 31, 2001
filing date -
Jul 19, 1999
priority date (Note) -
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Abstract
A method of processing the surface of a workpiece using an adaptive gas cluster ion beam is disclosed. The invention provides a method of reducing the surface roughness and/or improving the surface smoothing of a workpiece by etching at various etch rates. The workpiece is initially processed with a gas cluster ion beam having an initial etch rate and then the beam is adjusted so that the workpiece is processed with one or more lower etch rates. The advantages are minimum required processing time, minimum remaining roughness of the final surface, and minimum material removal in order to attain a desired level of smoothness.
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