Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface
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United States of America Patent
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Oct 5, 2004
Grant Date -
Sep 11, 2003
app pub date -
Jan 3, 2003
filing date -
Jan 5, 1999
priority date (Note) -
Expired
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Abstract
Chemical generator and method for generating a chemical species at a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The species is generated by creating free radicals, and combining the free radicals to form the chemical species at the point of use.
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