Apparatus and method for fabricating carbon thin film

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United States of America Patent

PATENT NO 6800177
APP PUB NO 20040011641A1
SERIAL NO

10369534

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An apparatus and method for fabricating a carbon thin film are disclosed in the present invention. The apparatus includes a vacuum chamber having a substrate mounted therein, a sputter target inside the vacuum chamber facing into the substrate, a cesium supplying unit inside the vacuum chamber in a shape of a shield to a circumference of the target and supplying cesium vapor onto a surface of the sputter target through a plurality of openings, and a heating wire surrounding the cesium supplying unit and maintaining the cesium supplying unit at a constant pressure.

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Patent Owner(s)

Patent OwnerAddress
PLASMION CORPORATION50 HARRISON STREET HOBOKEN NJ 07030

International Classification(s)

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  • 2003 Application Filing Year
  • C23C Class
  • 1185 Applications Filed
  • 451 Patents Issued To-Date
  • 38.06 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances20032004200520062007200820092010201120122013201420150255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Steven Harrington Park, NJ 194 7653
Shin, Kyung-Ho Seoul, KR 10 117

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  • C23C Class
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Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges141998945301399733901 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 9091 - 100100 +0102030405060708090100110120130140150160170180190200210

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