Elements having erosion resistance
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United States of America Patent
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Sep 14, 2004
Grant Date -
Aug 28, 2003
app pub date -
Feb 27, 2002
filing date -
Feb 27, 2002
priority date (Note) -
Expired
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Abstract
A component of a plasma reactor chamber for processing a semiconductor workpiece, the component being a monolithic ceramic piece formed from a mixture of yttrium aluminum perovskite (YAP) and yttrium aluminum garnet (YAG) formed from a mixture of yttria and alumina powders, the ratio the powders in said mixture being within a range between one ratio at which at least nearly pure yttrium aluminum perovskite is formed and another ratio at which at least nearly pure yttrium aluminum garnet is formed.
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