Apparatus for method for immersion lithography
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United States of America Patent
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Sep 7, 2004
Grant Date -
Apr 22, 2004
app pub date -
Oct 22, 2002
filing date -
Oct 22, 2002
priority date (Note) -
Reissued
status (Latency Note)
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Abstract
An apparatus for immersion lithography that includes an imaging lens which has a front surface, a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive index between about 1.0 and about 2.0 filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.
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