Apparatus for determining doping concentration of a semiconductor wafer
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United States of America Patent
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Sep 7, 2004
Grant Date -
Jan 15, 2004
app pub date -
Jul 9, 2003
filing date -
Apr 11, 2002
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus for measuring at least one electrical property of a semiconductor wafer includes a probe including a shaft having at a distal end thereof a conductive tip for electrically communicating with an object area of the semiconductor wafer. The apparatus further includes a device for applying an electrical stimulus between the conductive tip and the object area, and a device for measuring a response of the semiconductor wafer to the electrical stimulus and for determining from the response the at least one electrical property of the object area of the semiconductor wafer. A probe guard is included and surrounds the shaft of the probe adjacent the distal end of the probe. The probe guard also insulates the conductive tip from the semiconductor wafer.
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