Chuck equipment
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United States of America Patent
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Aug 24, 2004
Grant Date -
Sep 26, 2002
app pub date -
Jan 24, 2001
filing date -
Jul 26, 1999
priority date (Note) -
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status (Latency Note)
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Abstract
A chuck equipment which can hold insulating substrates is provided. First and second electrodes are provided to be exposed on the base the surface of which is insulated. The insulating substrate is placed in contact with or in close proximity to the surfaces of the first and second electrodes. Since an electric field having a high rate of spatial change is established between the first and second electrodes, the substrate is held against the surface of the chuck equipment by the gradient force. Since the magnitude of the gradient force depends on that of the rate of change of the electric field, a voltage may be applied between the first and second electrodes to establish an electric field of 1.0.times.10.sup.6 V/m or greater.
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