Method of inspecting pattern and inspecting instrument
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United States of America Patent
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Aug 17, 2004
Grant Date -
Nov 20, 2003
app pub date -
Jun 18, 2003
filing date -
Dec 2, 1999
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Abstract
A pattern inspection system for inspecting a substrate surface on which a predetermined pattern is formed with radiation of an electron beam and an optical beam. the pattern inspection system includes a radiation and which radiates an electron beam to the substrate, a detection unit which detects a secondarily generated signal attributable to the radiation of the electron beam, a retrieval unit which retrieves an image from the signal detected by the detection unit, and an image processing unit which classifies the retrieved image depending on a type of the image.
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