Method and apparatus for cleaning surfaces
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United States of America Patent
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Aug 17, 2004
Grant Date -
Feb 5, 2004
app pub date -
Jan 9, 2003
filing date -
Jul 31, 2002
priority date (Note) -
Expired
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Abstract
This invention relates to a method and apparatus for cleaning solid surfaces like Si substrate, disk or magnetic head slider where contaminants, including organic contaminants, especially particles in the micron or sub-micron scale are effectively remove from the solid surfaces. The invention achieves this by generating a strong laser-induced liquid jet and shock wave near the solid surfaces immersed in liquid. The liquid is a solution of water and other solvents to help reduce adhesion force and enhance cleaning efficiency.
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