Method and apparatus for forming a curved polyline on a radiation-sensitive resist
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United States of America Patent
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Aug 10, 2004
Grant Date -
Nov 15, 2001
app pub date -
Mar 5, 2001
filing date -
Mar 8, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.
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