Copolyesters having improved retained adhesion

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United States of America Patent

PATENT NO 6774183
SERIAL NO

09559794

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Abstract

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The present invention provides copolyester compositions and novel methods employing such compositions. The copolymer compositions comprise a copolyester containing a low polarity block in the copolyester backbone, thereby resulting in adhesive and coating materials that exhibit improved flow and wettablility and superior initial adhesion and retained adhesion to various substrates.

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Patent Owner(s)

Patent OwnerAddress
BOSTIK INC11320 WEST WATERTOWN PLANK ROAD WAUWATOSA WI 53226

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Palumbo, Jeffrey T Bedford, MA 1 24
Rossitto, Francis C Danvers, MA 2 25
Sommerfeld, Eugene Gary Danvers, MA 1 24

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