System for frequency adjustment of piezoelectric resonators by dual-track ion etching
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United States of America Patent
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-
Aug 10, 2004
Grant Date -
Aug 1, 2002
app pub date -
Jan 31, 2001
filing date -
Jan 31, 2001
priority date (Note) -
Expired
status (Latency Note)
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Abstract
System for frequency adjustment of piezoelectric resonators by ion etching in vacuum, based on arranging the resonators in rows and columns on a tray that can be moved to simultaneously expose two rows of resonators to the two straight-track portions of an ion gun having a race-track-shaped beam pattern whose straight tracks are spaced at an integer multiple of the inter-row spacing d. As the tray is moved in steps of d, two rows can be etched simultaneously, and each row can be sequentially exposed to a 'pre-etch' and 'final-etch' stage, with time between the two stages for the resonators to cool down after the 'pre-etch' stage.
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