Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
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United States of America Patent
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Aug 3, 2004
Grant Date -
Jan 22, 2004
app pub date -
Jul 2, 2003
filing date -
Sep 2, 1996
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Abstract
The invention describes the use of oxime alkyl sulfonate compounds of formula 1 ##STR1## R.sub.0 is either an R.sub.1 --X group or R.sub.2 ; X is a direct bond, an oxygen atom or a sulfur atom; R.sub.1 is hydrogen, C.sub.1 -C.sub.4 alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C.sub.1 -C.sub.4 alkyl and C.sub.1 -C.sub.4 -alkyloxy; R.sub.2 is hydrogen or C.sub.1 -C.sub.4 alkyl; and R.sub.3 is straight-chain or branched C.sub.1 -C.sub.12 alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
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