Holder for flat workpieces, particularly semiconductor wafers
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United States of America Patent
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Jul 27, 2004
Grant Date -
Jun 20, 2002
app pub date -
Dec 13, 2001
filing date -
Dec 14, 2000
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A holder for semiconductor wafers in an apparatus for chemical-mechanical polishing of semiconductor wafers, having a disk-shaped head, a holding plate and a ring-shaped membrane attached to the carrier section and the holding plate which defines a pressure chamber between these components, the bores in the holding plate being connected with the pressure chamber, a contact membrane of elastomeric gas-impermeable material having a peripheral edge which is fixedly connected to a peripheral portion of the holding plate in a gas-tight manner and engages the lower side of the holding plate.
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