EUV condenser with non-imaging optics
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United States of America Patent
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Jul 6, 2004
Grant Date -
Jul 31, 2003
app pub date -
Feb 7, 2003
filing date -
Jan 26, 1999
priority date (Note) -
Expired
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Abstract
An illumination system and condenser for use in photolithography in the extreme ultraviolet wavelength region has a first non-imaging optic element collecting electromagnetic radiation from a source and creates a desired radiance distribution. A second non-imaging optic element receives the electromagnetic radiation from the first non-imaging optic element and redirects and images the electromagnetic radiation. The electromagnetic radiation from the second non-imaging optic element is suitable for being received by other conventional optical surfaces to provide a desired radiance distribution with a desired angular distribution and desired shape. Facets are used to provide the desired illumination over the desired illumination field. Reflective facets may be placed on the second non-imaging optic, which can reduce the number of mirrors and increase efficiency. The condenser and illumination system are used in combination with a projection optic to project the image of a reticle or mask onto a photosensitive substrate, such as a semiconductor wafer. The condenser of the present invention provides an efficient condenser in a compact package and provides desirable illumination properties for imaging relatively small feature sizes of less than 0.13 microns.
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