Method for determining geometric structures on or in a substrate as well as material parameters

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United States of America Patent

PATENT NO 6753971
SERIAL NO

10111134

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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In order to determine geometric structures and/or material parameters on or in substrates and in a locally resolved manner over the substrate surface, the invention provides the following measures: Measuring reflection and/or transmission light intensity values of the diffracted light according to the wavelength; calculating the reflection and/or transmission light intensity values using an iteration model into which the individual layer-structure and/or material parameters enter, and; modifying the parameters until the measured and calculated values coincide to the greatest possible extent.

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Patent Owner(s)

Patent OwnerAddress
STEAG ETA-OPTIK GMBH52525 HEINSBERG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hertling, Rolf Aachen, DE 2 5

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