System and method for producing high purity colloidal silica and potassium hydroxide
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United States of America Patent
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Jun 8, 2004
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N/A
app pub date -
Sep 1, 2000
filing date -
Sep 1, 2000
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Abstract
A system and method are disclosed for producing high purity colloidal silica by the steps of providing a quantity of potassium silicate; subjecting the quantity of potassium silicate to an ion exchange process to remove a first portion of potassium therefrom to produce a quantity of colloidal silica; and subjecting the quantity of colloidal silica to ultrafiltration to remove a portion of sodium therefrom, producing a quantity of high purity colloidal silica. High purity potassium hydroxide may also be prepared by regenerating the ion exchange resin with an acid to produce a quantity of potassium salt, which may be further purified by evaporation, crystallization, then further processed by electrodialysis and/or electrolysis.
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