Process of forming thin film and precursor for chemical vapor deposition
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United States of America Patent
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Jun 1, 2004
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app pub date -
Nov 4, 2002
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Nov 15, 2001
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Abstract
A process of producing a strontium titanate, barium titanate or barium strontium titanate thin film by chemical vapor deposition which comprises using a titanium compound represented by formula (I): ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group; and R.sup.2 and R.sup.3 each represent a methyl group or an ethyl group, or R.sup.2 and R.sup.3 are connected together to form a methylene group, a methylmethylene group or a dimethylmethylene group.
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