Target and process for its production, and method of forming a film having a high refractive index
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United States of America Patent
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Jun 1, 2004
Grant Date -
Jan 2, 2003
app pub date -
Jul 10, 2002
filing date -
Aug 23, 1995
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Expired
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Abstract
A sputtering target comprising a substrate and a target material formed on the substrate, wherein the target material comprises a metal oxide of the chemical formula MO.sub.x as the main component, wherein MO.sub.x is a metal oxide which is deficient in oxygen as compared with the stoichiometric composition, and M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf, a process for its production, and a method for forming a film having a high refractive index.
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