Substrate treatment process and apparatus
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United States of America Patent
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Jun 1, 2004
Grant Date -
Jul 26, 2001
app pub date -
Dec 22, 2000
filing date -
Dec 24, 1999
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A substrate treatment process is disclosed to remove organic matter existing on a substrate such as a wafer, glass substrate or ceramic. The process comprises treating the substrate with ozone water and then with hydrogen water, or treating the substrate with ozone-hydrogen water or treating the substrate with ozone water and hydrogen water at the same time.
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