Process for fabricating a microelectromechanical optical component
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United States of America Patent
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May 25, 2004
Grant Date -
Feb 6, 2003
app pub date -
Jul 26, 2002
filing date -
Jul 31, 2001
priority date (Note) -
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Abstract
A process for fabricating a microelectromechanical optical component from a silicon substrate is disclosed. The component comprises optical propagation guides; a wall which can move with respect to the propagation guides; and an electrostatic actuator associated with return means formed by at least one beam capable of causing the moving wall to move with respect to the rest of the substrate. The substrate is single-crystal silicon having (111) crystallographic planes parallel to the plane of the substrate. The process comprises a first series of deep reactive ion etching steps during which the heights of the moving wall, of the electrodes of the actuator, and of the beams of the return means of the actuator are defined with different values, and a second wet etching step, making it possible to free the moving wall, the electrodes and the beams from the rest of the substrate.
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