Gas discharge laser with means for removing gas impurities
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United States of America Patent
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May 11, 2004
Grant Date -
Dec 26, 2002
app pub date -
Jun 12, 2002
filing date -
Jun 18, 2001
priority date (Note) -
Expired
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Abstract
In an excimer laser or a molecular fluorine laser, a heating element is used which is heated to temperatures in excess of 60.degree. C., in order to remove impurities from the laser gas.
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